Integrated circuit: fabrication process: oxidation, diffusion, ion implantation, photolithography, etching, chemical vapor deposition, sputtering, twin-tub CMOS process.Įlectronic Devices and Circuit Application is the first of four volumes in the Fundamentals of Electronics series. Opto–Electronics: Optical absorption in semiconductors, photovoltaic effects, solar cells (p-n junction), Photoconductors, Photodiode, PIN photodiode, Avalanche photodiode, Phototransistor, LED, Semiconductor Laser (p-n junction) MOSFET: MOS capacitor, C-V characteristics, MOSFET, I-V characteristics, and small signal P-N junction: Physical Description of p-n junction, Basic device technologies for fabrication of a p-n junction, I-Vcharacteristics, and small signal switching models Avalanche breakdown, Zener diode, Schottky diode Bipolar Junction Transistor: Basic Construction, I-V characteristics, Ebers-Moll Model. Generation and recombination of carriers Poisson and continuity equation and Mobility, diffusion and drift of carriers, continuity equation, Injected minority carrier charge, Recombination and generation of charge carriers. Energy bands & Current Carriers in Semiconductors: Bonding Forces in Solids, Energy Bands theory in crystals (Qualitative Analysis), Metals, Semiconductors, & Insulators, Fermi-Level, Intrinsic and Extrinsic Semiconductors, Concept of Holes, Carrier Concentration.
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